TPP DLW專利分析期末報告 › ... › 2015_PatentProject › ppt › 1.pdf · •TPP...

TPP DLW專利分析期末報告HW_6

Members : 芮嘉瑋

鄭郁彬

Advisor : 張瑞芬特聘教授

12015/7/29

http://www.google.com.tw/url?url=http://mymkc.com/articles/contents.aspx?ArticleID=21359&rct=j&frm=1&q=&esrc=s&sa=U&ei=cdt_VPPnH8zi8AWqiYHABA&ved=0CB0Q9QEwBA&sig2=h20wNzrUIfUx0EuDyrjKjA&usg=AFQjCNEXoT1L1g2WRq0xFz_JUaYi2SuEgg

http://www.google.com.tw/url?url=http://mymkc.com/articles/contents.aspx?ArticleID=21359&rct=j&frm=1&q=&esrc=s&sa=U&ei=cdt_VPPnH8zi8AWqiYHABA&ved=0CB0Q9QEwBA&sig2=h20wNzrUIfUx0EuDyrjKjA&usg=AFQjCNEXoT1L1g2WRq0xFz_JUaYi2SuEgg

http://www.google.com.tw/url?url=http://www.yjh.com/zixun/201307/181.shtml&rct=j&frm=1&q=&esrc=s&sa=U&ei=Gtt_VIOjNtXz8gWn5YHoDQ&ved=0CDsQ9QEwEw&sig2=CYfkqrOfJDRh3te9a_2Lpw&usg=AFQjCNGNGio9Ia5Ko9u0XvOSXU1R-kLUNw

http://www.google.com.tw/url?url=http://www.yjh.com/zixun/201307/181.shtml&rct=j&frm=1&q=&esrc=s&sa=U&ei=Gtt_VIOjNtXz8gWn5YHoDQ&ved=0CDsQ9QEwEw&sig2=CYfkqrOfJDRh3te9a_2Lpw&usg=AFQjCNGNGio9Ia5Ko9u0XvOSXU1R-kLUNw

Advanced LIGA MEMS Lab

Process of Patent Analysis

1. 專利分析主題及其分析目的

•分析的技術領域

•專利分析的目的

2. 專利檢索策略與流程

•專利資料庫及檢索範圍

•檢索關鍵字的邏輯

•專利檢索策略與流程

•專利檢索結果

•專利分析流程架構與策略

3. 專利管理圖分析

•歷年專利活動分析

•發明人分析

•專利權人分析

•引證分析

4. 專利技術圖分析

•TPP DLW技術的專利分

類號

•重要專利權人歷年技術發展趨勢

•權利範圍(claim)人工解析魚骨分群

•分群依據

5. 重要廠商專利佈

局策略

•TOP assignee布局策略

•潛在競爭者的布局監控

6. 結論與佈局建議

•Correspond with the purpose of patent analysis

•專利佈局建議


Outline

• Patent Analysis of Top 5 Assignees• Patent Analysis of Potential Competitors• Nanoscribe Gmbh• Technische Universität Ilmenau• Purdue Research Foundation• Technion Research & Development Foundation Limited

• Principle of Cluster • Organize fish-bone figure and overview of that• Representative patent for each clustering• Technology - Function Clustering• Correspond with the purpose of patent analysis• Clustering by Algorithm


Outline

• Principle of Cluster

• Organize fish-bone figure and overview of that

• Representative patent for each clustering

• Technology - Function Clustering

• Correspond with the purpose of patent analysis


Cluster according to the claim analysis

Claim Analysis

Annotate each element in

independent claim

Identify patentable feature

Highlight patentable feature with one

sentence

Cluster and definition


Outline







TPP DLW

Photoniccrystal

Method

structureControldefect

Optical device

Type of surface of emission face

Light guides

Microlensarrays

nonsphericalmicrolense

truncated aspheric Geometric configuration

Organize fish-bone figure

Biotechnology(Health)

biological tissue

closing bleeding wound

surgery

photoreactive composition(Material)

inorganic particles

multi-photon photoinitiatorsystem

multi-photon photosensitizer

composition

electron acceptor

reactive species

Particle size

solubility

Volume %

electron Donor(optional)

photoinitiator

Bio-imagingtechnique

for detecting protein crystals

emission spectrum

diagnosisin vivo diagnosis or testing

medicine

pharmaceutical composition

Image system

apparatus

multiphoton microscopy

temporal focusingbased

having a prismatic optical element

microscopy confocal microscopy

focusing

endoscopy

Optical data storage medium

Beam energy control

exposure

optical recording material

iodonium salts, sulfonium salts

autofocus means function

Modeling(Microfabrication)

3D Print(layer-by-layer)

Single step

Multi-beaminterference



Technology Clustering

3D Printing (Additive manufacture,

layer by layer)

BiotechnologyUS20140142914

Layer thicknessUS20130286485

micro opticsmicro lense

US20130286485

integrates two-photon lithography and nanoimprinting

US20110046764US20120325775

process

structure

Tissue engineering

ScaffoldsUS20110046764

Cell growthUS7718351

US20100240117

artificial organUS20100240117

US8852932

Pores dimensionUS7718351,

US20100240117

materialPores material

US20100240117

Blood vesselsUS20080228455

Single step


Outline







Representative patent for each clustering


Outline







Technology - Function Clustering

TPP DLW技術

Image system

ModelingOptical device

TPP DLW功效

StabilityHigh spatial resolution

Simplified process

MaterialPhotoniccrystal

Biotechnology

Reduce writing time

Machining accuracy

High energydensity

Low cost Enhancingimage contrast


Preparation of Technology-Function Matrix


TPP DLW Technology-Function Matrix

Technology -Function

T1-Image system T2-Modeling T3-Optical device T4-Material T5-Photonic crystal T6-Biotechnology

T1-1 T1-2 T2-1 T2-2 T3-1 T3-2 T3-3 T4-1 T4-2 T4-3 T5-1 T5-2 T6-1 T6-2 T6-3

microscopy apparatus3D Print(layer by

layer)

Single step Microlens

arrays

Optical data storage medium

Light guidesreactive species

multi-photon photoinitiator

system inorganic particles

structure Method diagnosisBio-

imagingtechnique

biological tissue

F1Stability

16 9 2 6 4 5 2 5 3 5 0 1 0 3 4

F2High spatial resolution

28 11 2 9 5 8 3 1 1 2 1 1 2 3 5

F3Simplified process

1 2 2 4 2 4 4 4 4 2 0 2 1 0 0

F4Reduce writing time

2 1 1 5 3 5 2 5 2 1 2 1 1 2 1

F5Machining accuracy

23 6 2 6 5 6 3 0 1 3 3 0 0 1 2

F6High energy density

14 2 0 4 2 3 1 2 3 4 2 1 2 3 2

F7Low cost

4 2 1 0 1 2 0 6 10 6 1 0 1 0 0

F8Enhancing image contrast

9 6 0 1 1 0 1 5 1 3 0 0 2 7 6


Methods of fabricating electronic and mechanical structures US 20140231266 A1

Assignees: Nuvotronics, LLC

1. A method of fabricating three dimensional structures, comprising: a) selectively depositing at least one dielectric material comprising a metallizable composition onto a substrate using three dimensional printing, andb) selectively depositing metal onto the dielectric material comprising a metallizable composition.2. The method of claim 1, wherein the three dimensional printing is at least one of stereolithography, 2-photon stereolithography, inkjet, hot melt extrusion fabrication, or selective laser sintering.3. The method of claim 1, wherein at least one of the deposited dielectric materials that comprise a metallizable composition further comprises a photoimageable dielectric composition.

http://www.lexisnexis.com/totalpatent/linkSearch.do?id=0&srch_=APPLICANT-NAME(Nuvotronics, LLC)&searchType_=APPLICANT


3D Mold For Manufacturing Of Sub-Micron 3D Structures Using 2-D Photon Lithography And Nanoimprinting And Process Thereof

US 20110046764 A1

1. A process of manufacturing a 3D mold to fabricate a high-throughput and low cost sub-micron 3D structure product, said process integrating 2-photon lithography and nanoimprinting, comprising using 2-photon laser lithography and 3D write technology to make a 3D mold of each layer of the 3D structure product, using nanoimprinting to form a sheet of polymer film of each layer of the 3D structure from said 3D mold of that layer, and fabricating each layer to make the sub-micron 3D structure product.2. A 3D mold of a layer of a high-throughput and low cost sub-micron 3D structure product, wherein the 3D mold of the layer is created by a process comprising using 2-photon laser lithography and 3D write technology to make a 3D mold of each layer of the 3D structure product and using nanoimprinting to form a sheet of polymer film of each layer of the 3D structure to make the 3D mold of that layer of the sub-micron 3D structure product.3. A 3D mold of a layer of a high-throughput and low-cost sub-micron 3D structure product using a process which integrates 2-photon lithography and nanoimprinting, wherein the 3D mold of the layer is manufactured by a process comprising: creating a design of a 3D layer of the 3D structure;setting up a writing process to produce an 3D image of the layer of the 3D structure product using a 2-photon lithography tool;developing a photo resist/polymer of the 3D image of the layer on a substrate;sputtering one or more layers of metal onto the surface of the photoresist/polymer of the 3D image of the layer to form a seed metal layer; andtransferring the 3D polymer image coated with the seed metal layer by an electroplating process to form a 3D metal mold;wherein the 3D metal mold is used to manufacture a copy of the 3D image of the same layer of the 3D structure product.


3D Mold For Manufacturing Of Sub-Micron 3D Structures Using 2-D Photon Lithography And Nanoimprinting And Process Thereof

US 20130286485 A1

1. A micro-lens having a curved surface, wherein said curved surface is not limited by surface tension properties of a liquid used to make said micro-lens.2. The micro-lens of claim 1, wherein said surface is contoured to focus, reflect, guide and bend light.3. The micro-lens of claim 1, wherein said curved surface is non-spherical.4. The micro-lens of claim 1, wherein said curved surface is asymmetric.5. A 3D structure comprising a plurality of layers bonded together wherein each of said plurality of layers has a thickness of between 0.01 micron and 150 microns.8. The 3D structure of claim 5, wherein said structure comprises a scaffold.9. The 3D structure of claim 8, wherein said scaffold comprises a synthetic material10. The 3D structure of claim 8, wherein said scaffold comprises a biological material.11. The 3D structure of claim 8, wherein said structure comprises a tissue scaffold.12. The 3D structure of claim 8, wherein said structure comprises an organ scaffold.13. The 3D structure of claim 12, wherein said structure comprises an organ scaffold for a kidney.14. The 3D structure of claim 12, wherein said structure comprises an organ scaffold for a liver.


Method for a layer-wise manufacturing of a three-dimensional object US 9011982 B2

• 1. A method for a layer-wise manufacturing of a three-dimensional object, the method comprising the following steps:

• a first step of providing a layer of a material in a powder form onto a support or onto a prior layer;• a second step of directing a focussed electromagnetic radiation or a focussed particle beam

selectively onto selected positions of the layer;• wherein, in the second step, the focussed electromagnetic radiation or particle beam is selected

such that it induces a change of the absorption of the material when hitting the layer at the selected positions without complete melting or sintering; and

• after the second step, carrying out a third step, which is discrete from the second step, of completely melting or sintering the layer at those positions of the layer that correspond to the cross-section of the object to be formed using an electromagnetic radiation that is different from the focussed electromagnetic radiation or particle beam of the second step,

• wherein the first to third steps are repeatedly carried out until the object is completed, and• wherein the solidification in the third step is effected at those selected positions at which the

focussed electromagnetic radiation or particle beam had been directed in the second step.


Citation Analysis

Page. 21/4

不一定有關聯


Correspond with the purpose of patent analysis

R&D Strategy and Market Opportunity 建立分群依據、掌握技術魚骨、洞悉定位、研

擬未來研發方向或技術預測。掌握專利技術應用領域及其市場機會。

Knows the

status of art對該技術領域的全貌、技術子領域之技術分布及技術發展所處階段有全盤瞭解

Monitor trend

in art針對技術成長階段、技術遞移關係及技術發展方向來分析，以達到監控技術領域趨勢的目的

Monitor (potential)

competitor

藉由各技術分類歷年技術走向洞悉競爭者技術發展趨勢，進而了解重要廠商專利布局及其趨勢預測

Domain specific

patent analysis˙申請專利範圍分析˙法律狀態分析˙ Patent Valuation(option)


Cluster according to the claim analysis

Claim Analysis

Parse each element in independent

claim

Identify patentable feature

Highlight patentable feature with one

sentence

Cluster and definition



Technology Clustering

3D Printing (Additive manufacture,

layer by layer)

BiotechnologyUS20140142914

Layer thicknessUS20130286485

micro opticsmicro lense

US20130286485

integrates two-photon lithography and nanoimprinting

US20110046764US20120325775

process

structure

Tissue engineering

ScaffoldsUS20110046764

Cell growthUS7718351

US20100240117

artificial organUS20100240117

US8852932

Pores dimensionUS7718351,

US20100240117

materialPores material

US20100240117

Blood vesselsUS20080228455

Single step


Outline

• Patent Analysis of Top 5 Assignees• Patent Analysis of Potential Competitors• Nanoscribe Gmbh• Technische Universität Ilmenau• Purdue Research Foundation• Technion Research & Development Foundation Limited

• Principle of Cluster • Organize fish-bone figure and overview of that• Representative patent for each clustering• Technology - Function Clustering• Correspond with the purpose of patent analysis• Clustering by Algorithm

系統分群方法

PATENT NUMBER/KEY TERM

20020001089… US8969219 NTF NTF-IDF Rate(%)

2-d 0 … 0 82.23 81.4077 1

3-dimensional 0 … 0 86.2 84.476 2

ablation 0 … 0 164.92 158.323 4

… … … … … … …

Patent Import

專利匯入

TF-IDF

詞頻逆向文詞頻解析

Modifying Term

調整關鍵字詞

K-means Analyzing

K-means方法解析

Grouping Analyzing

群組分析

類群化

Clustering_Number RMSSTD

1/RS Sum

2 3.2891 108.696

111.985

3 3.1706 11.8624

15.033

4 3.1606 10.5263

13.6869

分類分群


Patent Pool

402

OthersMethod(CMP)

化學機械平坦化

20090311955

US7377840

US8287793

US8932116

2D

3D+2D

US6027855Optical Recording

Material

RFID US7681301

Tissue

US5853370 US6397099 US6544794

US6745067 US7372985 US7711410

US7724937 US7805183 US8144966

US8221480 US8351675 US8712012

US8771978

imaging

chemical

US8828355

US8634131

US7938980

US8629197

Recording

Masterforms

US7312021 US7542186

US7803514 US8227150

US8609013 US8642991

US8004767

US7583444

metal optical

grayscale mask

Photoeractive

Recording Method

US7232913

US7282320

USS7285363

US7928222

US8207330

US7778723

US7790353

US8404173

US8133642

Recording device

Detecting Method

Display System

Photographic

US7969646

US8445178

US7848205

US7560869

US7728295

Plasmon

Nanoparticle

containing

precursors

Laser radiation/

Femtosecond

System and

MethodTomography

US7568365

US8279903

US8599658

US7252699

US8557017

US8779030

US7462496

US7492458

Microscope

Method

Process

Counterfeiting

protection

High resolution

microscope

imaging or cutting

in laser endoscopy

US8183531

US8718351 US8487271 US8389893

US8183531 US7902526 US7872748

US7642536 US7342717 US7304745

48

US7936956

US7642509

US7815117

US7757952

US8496579

Surface

Modification

Short wavelength coherence

tomography

Optical information device

US7943533

US7656538

US8031577

比較分析

TPP

DLW

Image

System

Optical

Device

Photoni

c Crystal

Photoreactive

composition

(Material)

Exposur

e

apparat

us

Light

Guide

Microle

ns

arrays

truncated aspheric Geometric configuration

nonspherical microlense

Type of surface of emission face

Method

Structur

e

controlled defect

Inorgani

c

Particles

Reactive

Species

Multi-photon

photoinitiator system

iodonium salts, sulfonium salts

having a two-photon absorption cross-section greater than that of fluorescein;

multi-photon photosensitizer

photoinitiator

electron acceptor

electron Donor(optional)

composition

solubility

Particle size

Volume %

US7583444US8004767

US7583444US8004767US7941013US7936956

TPP DLW專利分析期末報告 › ... › 2015_PatentProject › ppt › 1.pdf · •TPP...

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